In Lab Facilities
Pulsed Laser Deposition (Oxide Chamber)
This PLD chamber is used for oxide-based thin-film deposition such as gallium oxide (with multiple target capabilities and a height-adjustable rotating heater). The primary part of this system is a coherent laser source having a wavelength of 248nm (KrF excimer laser).
PLD (Carbon Chamber)
This PLD chamber is used primarily for carbon-based thin-film deposition. This is also used for TiN, gold, and many other different thin-film depositions making it a versatile option.
Sputtering (RF & DC)
The aforementioned PLD chamber also comes with sputtering capabilities. Both DC and RF sputtering are available with different targets such as carbon, copper, gold, etc. Slower process but can handle deposition over a large area up to 4 inches to 6 inches diameter wafer.
Omicron XPS
X-ray photoelectron spectroscopy (XPS) is used for analyzing the deposited thin-films surface chemistry, chemical composition, and a lot more! A monochromatic X-ray source of Al is used to provide photons of known energy.
M-2000 J. A. Woollam Ellipsometry
Ellipsometry is a handy tool that is primarily used to determine film thickness and optical constants. Photon energy range: 6 eV to 1.2 eV; Angles of incidence: 55~90 degrees.
Bio-Rad Hall System
Used to measure the resistivity, carrier concentration, and mobility of a sample. It can provide a magnetic field of 0.325 Tesla.
UV-Visible Spectroscopy
UV-2600 Shimadzu optical spectrometer with a wavelength ranging from 200-900nm is used to measure the optical properties such as transmittance and absorbance of the oxide thin films.
Electrical Analysis Room
We have multiple Semiconductor parameter analyzers, probe stations, and precision impedance analyzers used for electrical characterization.
Raman Spectroscopy
This system has two laser sources with a wavelength of 532 nm or 780 nm as excitation sources having 10X & 50X object zoom lenses. It is used to detect vibrational, rotational, and other states in a molecular system, capable of probing the chemical composition of the material.
Shared Research Operations (SRO) Facilities
Besides the in-lab facilities, the lab members also have access to numerous state-of-the-art facilities in the SRO that are managed by experienced professionals. They provide the required training, are very eager to assist with the tools, and always keep them up-to-date.
Cronus semi-automated Probe System & Semiconductor Parameter Analyzer
Bruker Atomic Force Microscope (AFM)
HELIOS 4000 FEI SEM
JEOL Secondary Electron Microscope (SEM)
Rigaku Smart Lab X-ray Diffractometer (XRD)
Talos Transmission Electron Microscope (TEM)
Nanofabrication Research Service Center (NRSC) Cleanroom
Cleanroom
SuSS MJB4 Contact Aligner
Wafer Bonder
Xanthos Hood
Sputtering System
PECVD
Oxford ICP/RIE
RTP
E-Beam Evaporator
PEALD
Hydra Hood
And many more advanced facilities. Visit the Shared Research Facilities (SRO) page for more details!