Facilities

This PLD chamber is used for oxide-based thin-film deposition such as gallium oxide (with multiple target capabilities and a height-adjustable rotating heater). The primary part of this system is a coherent laser source having a wavelength of 248nm (KrF excimer laser).

This PLD chamber is used primarily for carbon-based thin-film deposition. This is also used for TiN, gold, and many other different thin-film depositions, making it a versatile option.

The aforementioned PLD chamber also comes with sputtering capabilities. Both DC and RF sputtering are available with different targets such as carbon, copper, gold, etc. Slower process but can handle deposition over a large area up to 4 inches to 6 inches diameter wafer.

This Excel Instrument PLA system can be used for air, vacuum and liquid submerged annealing.

This Excel Instrument HFCVD system can reach a substrate temperature of 800 degree C and filament temperature of ~2100 degree C.

X-ray photoelectron spectroscopy (XPS) is used for analyzing the deposited thin-films surface chemistry, chemical composition, and a lot more! A monochromatic X-ray source of Al is used to provide photons of known energy.

Ellipsometry is a handy tool that is primarily used to determine film thickness and optical constants. Photon energy range: 6 eV to 1.2 eV; Angles of incidence: 55~90 degrees.

Used to measure the resistivity, carrier concentration, and mobility of a sample. It can provide a magnetic field of 0.325 Tesla.

We have multiple Semiconductor parameter analyzers, probe stations, and precision impedance analyzers used for electrical characterization.

Besides the in-lab facilities, the lab members also have access to numerous state-of-the-art facilities in the CRO that are managed by experienced professionals. They provide the required training, are very eager to assist with the tools, and always keep them up-to-date.